Explicit modelling of SOA formation from alpha-pinene photooxidation: sensitivity to vapour pressure estimation
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February 10, 2016 10:23 AM
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Valorso R; Aumont B; Camredon M; Raventos-Duran T; Mouchel-Vallon C; Ng NL; Seinfeld JH; Lee-Taylor J; Madronich S
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