Effect of total gas pressure and O-2/N-2 flow rate on the nanostructure of N-doped TiO2 thin films deposited by reactive sputtering Journal Article uri icon

Overview

publication date

  • February 3, 2014

Date in CU Experts

  • January 15, 2020 9:42 AM

Full Author List

  • Baker MA; Fakhouri H; Grilli R; Pulpytel J; Smith W; Arefi-Khonsari F

author count

  • 6

citation count

  • 15

Other Profiles

International Standard Serial Number (ISSN)

  • 0040-6090

Additional Document Info

start page

  • 10

end page

  • 17

volume

  • 552