Molecular-beam epitaxy growth of strontium thiogallate Journal Article uri icon



  • The molecular-beam epitaxy growth and characterization of cerium doped strontium thiogallate (SrGa2S4:Ce) thin film phosphors are reported. The layers were grown on GaAs, and glass/indium tin oxide/dielectric stack substrates for device fabrication. Ga2S3/Sr beam equivalent pressure ratios of 20–100 and CeCl3/Sr flux (molecules cm−2 s−1) ratios of 1/20–1/10 were investigated in this study. The substrate temperature was varied between 530 and 575 °C. A typical SrGa2S4:Ce film growth rate of 0.5 μm/h was obtained with Sr, Ga2S3, and CeCl3 beam equivalent pressures of 2.0×10−7, 1.0×10−5, and 3.5×10−8 Torr, respectively. Characterization of the layers’ structural and optical properties by x-ray diffraction, transmission electron microscopy, energy dispersive x-ray spectroscopy, and photoluminescence spectroscopy is presented.

publication date

  • May 1, 1996

has restriction

  • closed

Date in CU Experts

  • April 12, 2014 3:30 AM

Full Author List

  • Yang T; Wagner BK; Chaichimansour M; Park W; Wang ZL; Summers CJ

author count

  • 6

Other Profiles

International Standard Serial Number (ISSN)

  • 1071-1023

Electronic International Standard Serial Number (EISSN)

  • 1520-8567

Additional Document Info

start page

  • 2263

end page

  • 2266


  • 14


  • 3