ULTRAHIGH-VACUUM CHEMICAL VAPOR-DEPOSITION OF RHODIUM THIN-FILMS ON CLEAN AND TIO2-COVERED SI(111) Journal Article uri icon

Overview

publication date

  • February 28, 1992

Full Author List

  • LU JP; CHU PW; RAJ R; GYSLING H

Other Profiles

Additional Document Info

start page

  • 172

end page

  • 176

volume

  • 208

issue

  • 2