Trimethylaluminum as the Metal Precursor for the Atomic Layer Etching of Al2O3 Using Sequential, Self-Limiting Thermal Reactions Journal Article uri icon

Overview

publication date

  • May 10, 2016

Full Author List

  • Lee Y; DuMont JW; George SM

Other Profiles

Additional Document Info

start page

  • 2994

end page

  • 3003

volume

  • 28

issue

  • 9