Trimethylaluminum as the Metal Precursor for the Atomic Layer Etching of Al2O3 Using Sequential, Self-Limiting Thermal Reactions Journal Article uri icon

Overview

publication date

  • May 10, 2016

has restriction

  • closed

Date in CU Experts

  • June 8, 2016 10:24 AM

Full Author List

  • Lee Y; DuMont JW; George SM

author count

  • 3

citation count

  • 83

Other Profiles

International Standard Serial Number (ISSN)

  • 0897-4756

Electronic International Standard Serial Number (EISSN)

  • 1520-5002

Additional Document Info

start page

  • 2994

end page

  • 3003

volume

  • 28

issue

  • 9