Dr. George’s research interests are in the areas of surface chemistry, thin film growth and etching, and nanostructure engineering. He is currently directing a research effort focusing on atomic layer deposition (ALD), molecular layer deposition (MLD) and atomic layer etching (ALE). This research is examining new surface chemistry, measuring thin film growth rates, measuring thin film etching rates, characterizing the properties of films and developing new reactors for ALD, MLD & ALE. Special areas of expertise are developing new surface chemistries for hybrid organic-inorganic hybrid polymers and in situ methods for monitoring the growth & etching of ALD & MLD films. There are many applications of ALD, MLD & ALE to modern technology. Application areas include: semiconductor processing, MEMS/NEMS, Li ion batteries, fuel cells, supercapacitors, gas sensors, nano-photovoltaic devices, gas diffusion barriers and flexible & protective coatings.
Surface Chemistry, Thin Film Growth & Etching, Nanostructure Engineering, Atomic Layer Deposition, Molecular Layer Deposition, Characterization and Properties of Thin Films, Materials Chemistry, Atomic Layer Etching
CHEM 2101 - Laboratory for Chemical Energetics and Dynamics
Coordinates with the lectures topics in CHEM 2100. Emphasizes the acquisition of more advanced laboratory skills, experimental design, data interpretation and analysis. Department enforced corequisite: CHEM 2100. Degree credit not granted for this course and CHEM 1134.
CHEM 5251 - Materials Chemistry and Properties
Fall 2019 / Fall 2020 / Fall 2021
Lec. Understanding of materials from chemistry perspective including metals, oxides, semiconductors and polymers. Basic description of chemical preparation of materials. Overview of fundamental properties of materials including structural, chemical, mechanical, thermal, electrical, and optical properties. Description of behavior of materials and various applications in modern technology. Discussion of materials characterization methods. Same as CHEM 4251.
CHEM 5281 - Semiconductor Processing and Device Fabrication
Spring 2019 / Spring 2021
Understanding of semiconductor processing and device fabrication from chemistry perspective. Overview of processing steps used to fabricate inorganic semiconductor devices including deposition, patterning and etching techniques. Description of process integration during device fabrication. Discussion of key issues facing advanced semiconductor fabrication.
CHEM 5571 - Surface Science
Spring 2018 / Spring 2020
Lect. Principles of surface science with emphasis on fundamental surface phenomena, surface techniques and surface chemistry. Basic description of surfaces, adsorbate-surface interactions, surface kinetics and methods of surface analysis. Surface science of heterogeneous catalysis, semiconductor processing, and environmental interfaces. Department enforced prerequisites: undergraduate physical chemistry and graduate standing or instructor consent.
CHEM 6901 - Research in Chemistry
Spring 2018 / Fall 2018 / Spring 2019 / Spring 2020 / Fall 2020 / Spring 2021
May be repeated up to 15 total credit hours.