Thermal Atomic Layer Etching of SiO2 by a "Conversion-Etch" Mechanism Using Sequential Reactions of Trimethylaluminum and Hydrogen Fluoride Journal Article uri icon

Overview

publication date

  • March 22, 2017

Full Author List

  • DuMont JW; Marquardt AE; Cano AM; George SM

Other Profiles

Additional Document Info

start page

  • 10296

end page

  • 10307

volume

  • 9

issue

  • 11