Thermal Atomic Layer Etching of SiO2 by a "Conversion-Etch" Mechanism Using Sequential Reactions of Trimethylaluminum and Hydrogen Fluoride Journal Article uri icon

Overview

publication date

  • March 22, 2017

has restriction

  • closed

Date in CU Experts

  • March 18, 2017 5:54 AM

Full Author List

  • DuMont JW; Marquardt AE; Cano AM; George SM

author count

  • 4

citation count

  • 76

Other Profiles

International Standard Serial Number (ISSN)

  • 1944-8244

Electronic International Standard Serial Number (EISSN)

  • 1944-8252

Additional Document Info

start page

  • 10296

end page

  • 10307

volume

  • 9

issue

  • 11