Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements Journal Article
Overview
publication date
- May 1, 2011
has restriction
- closed
Date in CU Experts
- December 18, 2018 4:31 AM
Full Author List
- Wojcik H; Merkel U; Jahn A; Richter K; Junige M; Klein C; Gluch J; Albert M; Munnik F; Wenzel C
author count
- 11
citation count
- 9
published in
- Microelectronic Engineering Journal
Other Profiles
International Standard Serial Number (ISSN)
- 0167-9317
Electronic International Standard Serial Number (EISSN)
- 1873-5568
Digital Object Identifier (DOI)
Additional Document Info
start page
- 641
end page
- 645
volume
- 88
issue
- 5