Thermal Atomic Layer Etching of Silicon Using O2, HF, and Al(CH3)3 as the Reactants Journal Article
Overview
publication date
- December 11, 2018
has restriction
- closed
Date in CU Experts
- January 2, 2019 7:06 AM
Full Author List
- Abdulagatov AI; George SM
author count
- 2
citation count
- 46
published in
- Chemistry of Materials Journal
Other Profiles
International Standard Serial Number (ISSN)
- 0897-4756
Electronic International Standard Serial Number (EISSN)
- 1520-5002
Digital Object Identifier (DOI)
Additional Document Info
start page
- 8465
end page
- 8475
volume
- 30
issue
- 23