The effect of ultrathin ALD films on the oxidation kinetics of SiC in high-temperature steam Journal Article uri icon

Overview

publication date

  • June 29, 2019

has restriction

  • closed

Date in CU Experts

  • April 3, 2019 11:12 AM

Full Author List

  • Hoskins AL; Gossett TA; Musgrave CB; Weimer AW

author count

  • 4

citation count

  • 4

Other Profiles

International Standard Serial Number (ISSN)

  • 0009-2509

Electronic International Standard Serial Number (EISSN)

  • 1873-4405

Additional Document Info

start page

  • 230

end page

  • 236

volume

  • 201