A chemical mechanism for nitrogen incorporation into HfO2 ALD films using ammonia and alkylamide as precursors Journal Article uri icon

Overview

publication date

  • October 20, 2005

Full Author List

  • Xu Y; Musgrave CB

Other Profiles

Additional Document Info

start page

  • L280

end page

  • L285

volume

  • 591

issue

  • 1-3