Atomic layer deposition of HfO2 using alkoxides as precursors Journal Article uri icon

Overview

publication date

  • September 30, 2004

has restriction

  • closed

Date in CU Experts

  • May 29, 2019 3:44 AM

Full Author List

  • Mui C; Musgrave CB

author count

  • 2

citation count

  • 25

Other Profiles

International Standard Serial Number (ISSN)

  • 1520-6106

Additional Document Info

start page

  • 15150

end page

  • 15164

volume

  • 108

issue

  • 39