Mechanism of atomic layer deposition of SiO2 on the silicon (100)-2x1 surface using SiCl4 and H2O as precursors Journal Article uri icon

Overview

publication date

  • March 1, 2002

Date in CU Experts

  • May 29, 2019 3:44 AM

Full Author List

  • Kang JK; Musgrave CB

author count

  • 2

citation count

  • 50

Other Profiles

International Standard Serial Number (ISSN)

  • 0021-8979

Additional Document Info

start page

  • 3408

end page

  • 3414

volume

  • 91

issue

  • 5