Mechanism of atomic layer deposition of SiO2 on the silicon (100)-2x1 surface using SiCl4 and H2O as precursors
Journal Article
Overview
publication date
- March 1, 2002
Full Author List
- Kang JK; Musgrave CB
published in
- Journal of Applied Physics Journal
Other Profiles
Digital Object Identifier (DOI)
Additional Document Info
start page
- 3408
end page
- 3414
volume
- 91
issue
- 5