SF4 as the Fluorination Reactant for Al2O3 and VO2 Thermal Atomic Layer Etching Journal Article uri icon

Overview

publication date

  • May 28, 2019

Full Author List

  • Gertsch JC; Cano AM; Bright VM; George SM

Other Profiles

Additional Document Info

start page

  • 3624

end page

  • 3635

volume

  • 31

issue

  • 10