Atomic Layer Etching (ALE) using sequential thermal reactions: Atomic Layer Deposition (ALD) in reverse Conference Proceeding uri icon

Overview

publication date

  • April 2, 2017

Date in CU Experts

  • June 18, 2019 4:39 AM

Full Author List

  • George S; Lee Y; DuMont J; Johnson N; Zywotko D

author count

  • 5

Other Profiles

International Standard Serial Number (ISSN)

  • 0065-7727

Additional Document Info

volume

  • 253