Atomic Layer Etching (ALE) using sequential thermal reactions: Atomic Layer Deposition (ALD) in reverse Conference Proceeding
Overview
publication date
- April 2, 2017
Date in CU Experts
- June 18, 2019 4:39 AM
Full Author List
- George S; Lee Y; DuMont J; Johnson N; Zywotko D
author count
- 5
published in
presented at event
Other Profiles
International Standard Serial Number (ISSN)
- 0065-7727
Additional Document Info
volume
- 253