Thermal Atomic Layer Etching of Al2O3, HfO2, and ZrO2 Using Sequential Hydrogen Fluoride and Dimethylaluminum Chloride Exposures Journal Article uri icon

Overview

publication date

  • August 1, 2019

Full Author List

  • Lee Y; George SM

Other Profiles

Additional Document Info

start page

  • 18455

end page

  • 18466

volume

  • 123

issue

  • 30