Thermal Atomic Layer Etching of Al2O3, HfO2, and ZrO2 Using Sequential Hydrogen Fluoride and Dimethylaluminum Chloride Exposures Journal Article uri icon

Overview

publication date

  • August 1, 2019

Date in CU Experts

  • August 27, 2019 2:51 AM

Full Author List

  • Lee Y; George SM

author count

  • 2

citation count

  • 24

Other Profiles

International Standard Serial Number (ISSN)

  • 1932-7447

Electronic International Standard Serial Number (EISSN)

  • 1932-7455

Additional Document Info

start page

  • 18455

end page

  • 18466

volume

  • 123

issue

  • 30