Thermal Atomic Layer Etching of Amorphous and Crystalline Hafnium Oxide, Zirconium Oxide, and Hafnium Zirconium Oxide Conference Proceeding

Overview

CU Boulder Authors

George, Steven

publication date

April 22, 2019

has restriction

closed

Date in CU Experts

January 14, 2020 4:41 AM

Full Author List

Murdzek JA; George SM

author count

2

citation count

2

published in

International Symposium on VLSI Technology, Systems, and Applications, Proceedings Journal

presented at event

International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) Conference

Other Profiles

International Standard Serial Number (ISSN)

1930-8868

Digital Object Identifier (DOI)

https://doi.org/10.1109/vlsi-tsa.2019.8804645