ZrO2 Monolayer as a Removable Etch Stop Layer for Thermal Al2O3 Atomic Layer Etching Using Hydrogen Fluoride and Trimethylaluminum Journal Article
Overview
publication date
- December 8, 2020
has restriction
- closed
Date in CU Experts
- January 14, 2021 6:10 AM
Full Author List
- Zywotko DR; Zandi O; Faguet J; Abel PR; George SM
author count
- 5
citation count
- 9
published in
- Chemistry of Materials Journal
Other Profiles
International Standard Serial Number (ISSN)
- 0897-4756
Electronic International Standard Serial Number (EISSN)
- 1520-5002
Digital Object Identifier (DOI)
Additional Document Info
start page
- 10055
end page
- 10065
volume
- 32
issue
- 23