ZrO2 Monolayer as a Removable Etch Stop Layer for Thermal Al2O3 Atomic Layer Etching Using Hydrogen Fluoride and Trimethylaluminum Journal Article uri icon

Overview

publication date

  • December 8, 2020

has restriction

  • closed

Date in CU Experts

  • January 14, 2021 6:10 AM

Full Author List

  • Zywotko DR; Zandi O; Faguet J; Abel PR; George SM

author count

  • 5

citation count

  • 10

Other Profiles

International Standard Serial Number (ISSN)

  • 0897-4756

Electronic International Standard Serial Number (EISSN)

  • 1520-5002

Additional Document Info

start page

  • 10055

end page

  • 10065

volume

  • 32

issue

  • 23