Improved nucleation of TiN atomic layer deposition films on SILK low-k polymer dielectric using an Al2O3 atomic layer deposition adhesion layer Journal Article uri icon

Overview

publication date

  • May 1, 2003

Full Author List

  • Elam JW; Wilson CA; Schuisky M; Sechrist ZA; George SM

Other Profiles

Additional Document Info

start page

  • 1099

end page

  • 1107

volume

  • 21

issue

  • 3