Article has an altmetric score of 3

Improved nucleation of TiN atomic layer deposition films on SILK low-k polymer dielectric using an Al2O3 atomic layer deposition adhesion layer Journal Article uri icon

Overview

publication date

  • May 1, 2003

has restriction

  • closed

Date in CU Experts

  • September 6, 2013 4:39 AM

Full Author List

  • Elam JW; Wilson CA; Schuisky M; Sechrist ZA; George SM

author count

  • 5

citation count

  • 48

Other Profiles

International Standard Serial Number (ISSN)

  • 1071-1023

Additional Document Info

start page

  • 1099

end page

  • 1107

volume

  • 21

issue

  • 3