Improved nucleation of TiN atomic layer deposition films on SILK low-k polymer dielectric using an Al2O3 atomic layer deposition adhesion layer Journal Article

Overview

CU Boulder Authors

George, Steven

publication date

May 1, 2003

Full Author List

Elam JW; Wilson CA; Schuisky M; Sechrist ZA; George SM

published in

Journal of vacuum science & technology. B, Microelectronics and nanometer structures : processing, measurement, and phenomena : an official journal of the American Vacuum Society Journal

Other Profiles

Digital Object Identifier (DOI)

10.1116/1.1577568

Additional Document Info

start page

1099

end page

1107

volume

21

issue

3