Improved nucleation of TiN atomic layer deposition films on SILK low-k polymer dielectric using an Al2O3 atomic layer deposition adhesion layer
Journal Article
Overview
publication date
- May 1, 2003
Full Author List
- Elam JW; Wilson CA; Schuisky M; Sechrist ZA; George SM
published in
Other Profiles
Digital Object Identifier (DOI)
Additional Document Info
start page
- 1099
end page
- 1107
volume
- 21
issue
- 3