Nondestructive, high-resolution, chemically specific 3D nanostructure characterization using extreme ultraviolet, coherent diffractive imaging reflectometry Conference Proceeding uri icon

Overview

abstract

  • A grand challenge in semiconductor metrology has been the nondestructive characterization 3D nanostructures and their multilayer structure, interfaces, and dopant concentrations. We combine extreme ultraviolet reflectometry with state-of-the-art ptychography imaging algorithms to achieve this goal.

publication date

  • January 1, 2023

has restriction

  • closed

Date in CU Experts

  • February 1, 2024 1:31 AM

Full Author List

  • Tanksalvala M; Esashi Y; Porter CL; Jenkins NW; Wang B; Zhang Z; Miley GP; Horiguchi N; Yazdi S; Liao C-T

author count

  • 13

Other Profiles

Additional Document Info

start page

  • LM1F.4

end page

  • LM1F.4