Selectivity between SiO2 and SiNx during Thermal Atomic Layer Etching Using Al(CH3)3/HF and Spontaneous Etching Using HF and Effect of HF + NH3 Codosing Journal Article uri icon

Overview

publication date

  • July 23, 2024

has restriction

  • closed

Date in CU Experts

  • July 10, 2024 5:43 AM

Full Author List

  • Junige M; George SM

author count

  • 2

Other Profiles

International Standard Serial Number (ISSN)

  • 0897-4756

Electronic International Standard Serial Number (EISSN)

  • 1520-5002

Additional Document Info

start page

  • 6950

end page

  • 6960

volume

  • 36

issue

  • 14