Selectivity between SiO2 and SiNx during Thermal Atomic Layer Etching Using Al(CH3)3/HF and Spontaneous Etching Using HF and Effect of HF + NH3 Codosing Journal Article
Overview
publication date
- July 23, 2024
has restriction
- closed
Date in CU Experts
- July 10, 2024 5:43 AM
Full Author List
- Junige M; George SM
author count
- 2
published in
- Chemistry of Materials Journal
Other Profiles
International Standard Serial Number (ISSN)
- 0897-4756
Electronic International Standard Serial Number (EISSN)
- 1520-5002
Digital Object Identifier (DOI)
Additional Document Info
start page
- 6950
end page
- 6960
volume
- 36
issue
- 14