Thermal atomic layer etching of crystalline aluminum nitride using sequential, self-limiting hydrogen fluoride and Sn(acac)(2) reactions and enhancement by H-2 and Ar plasmas Journal Article uri icon

Overview

publication date

  • September 1, 2016

Full Author List

  • Johnson NR; Sun H; Sharma K; George SM

Other Profiles

Additional Document Info

volume

  • 34

issue

  • 5