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Journal of Vacuum Science and Technology Part A: International Journal Devoted to Vacuum, Surfaces, and Films Journal

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09 Engineering, 02 Physical Sciences

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Molecular layer deposition of Nylon 2,6 polyamide polymer on flat and particle substrates in an isothermal enclosure containing a rotary reactor 2021
Hollow cathode plasma electron source for low temperature deposition of cobalt films by electron-enhanced atomic layer deposition 2021
Thermal atomic layer etching of amorphous and crystalline Al2O3 films 2021
Thermal atomic layer etching: A review 2021
Area-selective molecular layer deposition of nylon 6,2 polyamide: Growth on carbon and inhibition on silica 2021
Atomic layer deposition of hafnium and zirconium oxyfluoride thin films 2021
Conversion reactions in atomic layer processing with emphasis on ZnO conversion to Al2O3 by trimethylaluminum 2021
Thermal atomic layer etching of germanium-rich SiGe using an oxidation and "conversion-etch" mechanism 2021
Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition 2020
History of atomic layer deposition and its relationship with the American Vacuum Society (vol 31, 050818, 2013) 2020
Atomic layer deposition of aluminum oxyfluoride thin films with tunable stoichiometry 2020
Effect of crystallinity on thermal atomic layer etching of hafnium oxide, zirconium oxide, and hafnium zirconium oxide 2020
Thermal atomic layer etching of silicon nitride using an oxidation and "conversion etch" mechanism 2020
Thermal etching of AlF3 and thermal atomic layer etching of Al2O3 2020
Growth of cobalt films at room temperature using sequential exposures of cobalt tricarbonyl nitrosyl and low energy electrons 2019
Rapid atomic layer etching of Al2O3 using sequential exposures of hydrogen fluoride and trimethylaluminum with no purging 2018
Thermal atomic layer etching of HfO2 using HF for fluorination and TiCl4 for ligand-exchange 2018
Electron-enhanced atomic layer deposition of silicon thin films at room temperature 2018
Spatial atomic layer deposition for coating flexible porous Li-ion battery electrodes 2018
Spatial molecular layer deposition of polyamide thin films on flexible polymer substrates using a rotating cylinder reactor 2018
Structural and compositional characterization of RF magnetron cosputtered lithium silicate films: From Li2Si2O5 to lithium-rich Li8SiO6 2017
Thermal atomic layer etching of crystalline aluminum nitride using sequential, self-limiting hydrogen fluoride and Sn(acac)(2) reactions and enhancement by H-2 and Ar plasmas 2016
Spatial atomic layer deposition on flexible porous substrates: ZnO on anodic aluminum oxide films and Al2O3 on Li ion battery electrodes 2016
Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates 2015
Spatial atomic layer deposition on flexible substrates using a modular rotating cylinder reactor 2015
Waterless TiO2 atomic layer deposition using titanium tetrachloride and titanium tetraisopropoxide 2014
History of atomic layer deposition and its relationship with the American Vacuum Society 2013
Evaluating Al2O3 gas diffusion barriers grown directly on Ca films using atomic layer deposition techniques 2013
Evaluating operating conditions for continuous atmospheric atomic layer deposition using a multiple slit gas source head 2012
Nanocoating zinc alkoxide (zincone) hybrid polymer films on particles using a fluidized bed reactor 2012
Spatial atomic layer deposition: A route towards further industrialization of atomic layer deposition 2012
Phase, grain structure, stress, and resistivity of sputter-deposited tungsten films 2011
Photovoltaic manufacturing: Present status, future prospects, and research needs 2011
Nucleation and growth of tantalum nitride atomic layer deposition on Al(2)O(3) using TBTDET and hydrogen radicals 2009
Tungsten atomic layer deposition on cobalt nanoparticles 2008
Optimized reactive ion etch process for high performance SiC bipolar junction transistors 2007
Rotary reactor for atomic layer deposition on large quantities of nanoparticles 2007
Attenuation of hydrogen radicals traveling under flowing gas conditions through tubes of different materials 2006
Free molecular background flow in a vacuum chamber equipped with two-sided pumps 2006
In situ examination of tin oxide atomic layer deposition using quartz crystal microbalance and Fourier transform infrared techniques 2005
Surface chemistry and infrared absorbance changes during ZnO atomic layer deposition on ZrO2 and BaTiO3 particles 2005
Infrared spectroscopic study of atomic layer deposition mechanism for hafnium silicate thin films using HfCl2[N(SiMe3)(2)](2) and H2O 2004
Microstructure and properties of ultrathin amorphous silicon nitride protective coating 2003
Photoinduced anisotropy of second-harmonic generation from azobenzene-modified alkylsiloxane monolayers 2003
Charging of dust particles on surfaces 2001
Epitaxial growth of TiO2 thin films by pulsed laser deposition on GaAs(100) substrates 2001
Monte Carlo modeling of electron beam physical vapor deposition of yttrium 2000
Monte Carlo simulation of vapor transport in physical vapor deposition of titanium 2000
Modeling of silicon deposition process scale-up employing axisymmetric ring nozzle sources. I 1999
Three dimensional modeling of silicon deposition process scale-up employing supersonic jets. II 1999
Effects of wall recombination on the etch rate and plasma composition of an etch reactor 1998
Numerical simulation of the evolution of nanometer-scale surface topography generated by ion milling 1998
Monte Carlo analysis of a hyperthermal silicon deposition process 1998
Numerical study of the effects of reactor geometry on a chlorine plasma helicon etch reactor 1997
Particle beam mass spectrometer measurements of particle formation during low pressure chemical vapor deposition of polysilicon and SiO2 films 1996
H2O ADSORPTION-KINETICS ON SI(111)7X7 AND SI(111)7X7 MODIFIED BY LASER ANNEALING 1995
HYPERTHERMAL NEUTRAL BEAM ETCHING 1995
SAMPLE MANIPULATOR EMPLOYING A GAS-THERMAL SWITCH DESIGNED FOR HIGH-PRESSURE EXPERIMENTS IN AN ULTRAHIGH-VACUUM APPARATUS 1995
ADSORPTION AND DECOMPOSITION OF DICHLOROSILANE ON POROUS SILICON SURFACES 1995
ADSORPTION AND DECOMPOSITION OF TRICHLOROSILANE AND TRICHLOROGERMANE ON POROUS SILICON AND SI(100)2X1 SURFACES 1995
DYNAMICS OF THE DESORPTION OF D(2) AND H-2 FROM CU(111) 1993
DYNAMIC STUDIES OF THE INTERACTION OF D2 WITH A CU(111) SURFACE 1992
ADSORPTION AND DESORPTION-KINETICS FOR SIH2CL2 ON SI(111)7X7 1992
A REACTIVE COEVAPORATION SYSTEM FOR INSITU, EPITAXIAL YBA2CU3O7-X THIN-FILM DEPOSITION 1991
AMMONIA DECOMPOSITION ON SILICON SURFACES STUDIED USING TRANSMISSION FOURIER-TRANSFORM INFRARED-SPECTROSCOPY 1991
ELECTRONIC-STRUCTURE AND STABILITY OF II-VI SEMICONDUCTORS AND THEIR ALLOYS - THE ROLE OF METAL D-BANDS 1988
INTERACTIONS AND ELECTRONIC-ENERGY TRANSFER BETWEEN MOLECULES ON DIELECTRIC SURFACES - PHENANTHRENE ON AL2O3(1120) 1988
SURFACE-DIFFUSION OF CO ON RU(001) STUDIED USING LASER-INDUCED THERMAL-DESORPTION 1988
SURFACE-DIFFUSION OF CYCLOALKANES ON RU(001) 1988
SURFACE-DIFFUSION OF HYDROGEN ON CARBON-COVERED AND SULFUR-COVERED RU(001) STUDIED USING LASER-INDUCED THERMAL-DESORPTION 1988
HIGH-SPEED SCANNING TUNNELING MICROSCOPES 1988
THE DECOMPOSITION KINETICS OF METHANOL ON RU(001) STUDIED USING LASER-INDUCED THERMAL-DESORPTION 1987
A SIMPLE AND VERSATILE LIQUID-NITROGEN COOLED CRYOSTAT ON A DIFFERENTIALLY PUMPED ROTARY FEEDTHROUGH 1986

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