publication venue for

• Rapid atomic layer etching of Al2O3 using sequential exposures of hydrogen fluoride and trimethylaluminum with no purging 2018
• Thermal atomic layer etching of HfO2 using HF for fluorination and TiCl4 for ligand-exchange 2018
• Electron-enhanced atomic layer deposition of silicon thin films at room temperature 2018
• Spatial atomic layer deposition for coating flexible porous Li-ion battery electrodes 2018
• Spatial molecular layer deposition of polyamide thin films on flexible polymer substrates using a rotating cylinder reactor 2018
• Structural and compositional characterization of RF magnetron cosputtered lithium silicate films: From Li2Si2O5 to lithium-rich Li8SiO6 2017
• Thermal atomic layer etching of crystalline aluminum nitride using sequential, self-limiting hydrogen fluoride and Sn(acac)(2) reactions and enhancement by H-2 and Ar plasmas 2016
• Probabilistic distributions of pinhole defects in atomic layer deposited films on polymeric substrates 2016
• Spatial atomic layer deposition on flexible porous substrates: ZnO on anodic aluminum oxide films and Al2O3 on Li ion battery electrodes 2016
• Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates 2015
• Spatial atomic layer deposition on flexible substrates using a modular rotating cylinder reactor 2015
• Atmospheric pressure spatial atomic layer deposition web coating with in situ monitoring of film thickness 2014
• Waterless TiO2 atomic layer deposition using titanium tetrachloride and titanium tetraisopropoxide 2014
• History of atomic layer deposition and its relationship with the American Vacuum Society 2013
• Evaluating Al2O3 gas diffusion barriers grown directly on Ca films using atomic layer deposition techniques 2013
• Evaluating operating conditions for continuous atmospheric atomic layer deposition using a multiple slit gas source head 2012
• Nanocoating zinc alkoxide (zincone) hybrid polymer films on particles using a fluidized bed reactor 2012
• Spatial atomic layer deposition: A route towards further industrialization of atomic layer deposition 2012
• Photovoltaic manufacturing: Present status, future prospects, and research needs 2011
• Nucleation and growth of tantalum nitride atomic layer deposition on Al(2)O(3) using TBTDET and hydrogen radicals 2009
• Tungsten atomic layer deposition on cobalt nanoparticles 2008
• Optimized reactive ion etch process for high performance SiC bipolar junction transistors 2007
• Rotary reactor for atomic layer deposition on large quantities of nanoparticles 2007
• Wide-range vibratory vacuum gauge 2006
• Attenuation of hydrogen radicals traveling under flowing gas conditions through tubes of different materials 2006
• In situ examination of tin oxide atomic layer deposition using quartz crystal microbalance and Fourier transform infrared techniques 2005
• Surface chemistry and infrared absorbance changes during ZnO atomic layer deposition on ZrO2 and BaTiO3 particles 2005
• Infrared spectroscopic study of atomic layer deposition mechanism for hafnium silicate thin films using HfCl2[N(SiMe3)(2)](2) and H2O 2004
• Photoinduced anisotropy of second-harmonic generation from azobenzene-modified alkylsiloxane monolayers 2003
• Charging of dust particles on surfaces 2001
• Epitaxial growth of TiO2 thin films by pulsed laser deposition on GaAs(100) substrates 2001
• Numerical simulation of the evolution of nanometer-scale surface topography generated by ion milling 1998
• Influence of cluster diffusion on the coarsening of Xe films on Pt(111) 1997
• Particle beam mass spectrometer measurements of particle formation during low pressure chemical vapor deposition of polysilicon and SiO2 films 1996
• H2O ADSORPTION-KINETICS ON SI(111)7X7 AND SI(111)7X7 MODIFIED BY LASER ANNEALING 1995
• SAMPLE MANIPULATOR EMPLOYING A GAS-THERMAL SWITCH DESIGNED FOR HIGH-PRESSURE EXPERIMENTS IN AN ULTRAHIGH-VACUUM APPARATUS 1995
• ADSORPTION AND DECOMPOSITION OF DICHLOROSILANE ON POROUS SILICON SURFACES 1995
• ADSORPTION AND DECOMPOSITION OF TRICHLOROSILANE AND TRICHLOROGERMANE ON POROUS SILICON AND SI(100)2X1 SURFACES 1995
• ADSORPTION AND DESORPTION-KINETICS FOR SIH2CL2 ON SI(111)7X7 1992
• A REACTIVE COEVAPORATION SYSTEM FOR INSITU, EPITAXIAL YBA2CU3O7-X THIN-FILM DEPOSITION 1991
• AMMONIA DECOMPOSITION ON SILICON SURFACES STUDIED USING TRANSMISSION FOURIER-TRANSFORM INFRARED-SPECTROSCOPY 1991
• ELECTRONIC-STRUCTURE AND STABILITY OF II-VI SEMICONDUCTORS AND THEIR ALLOYS - THE ROLE OF METAL D-BANDS 1988
• INTERACTIONS AND ELECTRONIC-ENERGY TRANSFER BETWEEN MOLECULES ON DIELECTRIC SURFACES - PHENANTHRENE ON AL2O3(1120) 1988
• SURFACE-DIFFUSION OF CO ON RU(001) STUDIED USING LASER-INDUCED THERMAL-DESORPTION 1988
• SURFACE-DIFFUSION OF CYCLOALKANES ON RU(001) 1988
• SURFACE-DIFFUSION OF HYDROGEN ON CARBON-COVERED AND SULFUR-COVERED RU(001) STUDIED USING LASER-INDUCED THERMAL-DESORPTION 1988
• High‐speed scanning tunneling microscopes 1988
• THE DECOMPOSITION KINETICS OF METHANOL ON RU(001) STUDIED USING LASER-INDUCED THERMAL-DESORPTION 1987
• A SIMPLE AND VERSATILE LIQUID-NITROGEN COOLED CRYOSTAT ON A DIFFERENTIALLY PUMPED ROTARY FEEDTHROUGH 1986