Competition between Al2O3 atomic layer etching and AlF3 atomic layer deposition using sequential exposures of trimethylaluminum and hydrogen fluoride Journal Article uri icon

Overview

publication date

  • February 7, 2017

Date in CU Experts

  • February 11, 2017 3:28 AM

Full Author List

  • DuMont JW; George SM

author count

  • 2

citation count

  • 26

Other Profiles

International Standard Serial Number (ISSN)

  • 0021-9606

Electronic International Standard Serial Number (EISSN)

  • 1089-7690

Additional Document Info

volume

  • 146

issue

  • 5

number

  • ARTN 052819