Competition between Al₂O₃ atomic layer etching and AlF₃ atomic layer deposition using sequential exposures of trimethylaluminum and hydrogen fluoride Journal Article

Overview

CU Boulder Authors

George, Steven

publication date

February 7, 2017

has restriction

closed

Date in CU Experts

February 11, 2017 3:28 AM

Full Author List

DuMont JW; George SM

author count

2

citation count

33

published in

Journal of Chemical Physics Journal

Other Profiles

International Standard Serial Number (ISSN)

0021-9606

Electronic International Standard Serial Number (EISSN)

1089-7690

Digital Object Identifier (DOI)

https://doi.org/10.1063/1.4973310

Additional Document Info

volume

146

issue

5

number

ARTN 052819