Electron-enhanced SiO2 atomic layer deposition at 35 degrees C using disilane and ozone or water as reactants Journal Article uri icon

Overview

publication date

  • July 1, 2023

has restriction

  • closed

Date in CU Experts

  • July 29, 2023 5:36 AM

Full Author List

  • Gertsch JC; Sobell ZC; Cavanagh AS; Simka H; George SM

author count

  • 5

Other Profiles

International Standard Serial Number (ISSN)

  • 0734-2101

Electronic International Standard Serial Number (EISSN)

  • 1520-8559

Additional Document Info

volume

  • 41

issue

  • 4

number

  • ARTN 042404