Electron-enhanced atomic layer deposition of Ru thin films using Ru(DMBD)(CO)3 and effect of forming gas anneal Journal Article uri icon

Overview

publication date

  • December 1, 2023

has restriction

  • closed

Date in CU Experts

  • November 14, 2023 7:40 AM

Full Author List

  • Collings MA; Junige M; Cavanagh AS; Wang V; Kummel AC; George SM

author count

  • 6

citation count

  • 0

Other Profiles

International Standard Serial Number (ISSN)

  • 0734-2101

Electronic International Standard Serial Number (EISSN)

  • 1520-8559

Additional Document Info

volume

  • 41

issue

  • 6

number

  • ARTN 062408