Electron-enhanced atomic layer deposition of Ru thin films using Ru(DMBD)(CO)3 and effect of forming gas anneal Journal Article
Overview
publication date
- December 1, 2023
has restriction
- closed
Date in CU Experts
- November 14, 2023 7:40 AM
Full Author List
- Collings MA; Junige M; Cavanagh AS; Wang V; Kummel AC; George SM
author count
- 6
citation count
- 0
published in
Other Profiles
International Standard Serial Number (ISSN)
- 0734-2101
Electronic International Standard Serial Number (EISSN)
- 1520-8559
Digital Object Identifier (DOI)
Additional Document Info
volume
- 41
issue
- 6
number
- ARTN 062408