Nonlinear Behavior of Decrease in Reflectivity of Multilayer Mirrors for Extreme Ultraviolet Lithography Optics by High-Flux Extreme Ultraviolet Irradiation in Various Vacuum Environments Conference Proceeding

Overview

CU Boulder Authors

Miyake, Akira

publication date

November 9, 2010

has restriction

closed

Date in CU Experts

May 22, 2024 8:44 AM

Full Author List

Niibe M; Koida K; Kakutani Y; Nakayama T; Terashima S; Miyake A; Kubo H; Matsunari S; Aoki T; Kawata S

author count

10

published in

Japanese Journal of Applied Physics Journal

presented at event

23rd International Microprocesses and Nanotechnology Conference (MNC 2010) Conference

Other Profiles

International Standard Serial Number (ISSN)

0021-4922

Electronic International Standard Serial Number (EISSN)

1347-4065

Digital Object Identifier (DOI)

https://doi.org/10.1143/jjap.50.06gb05

Additional Document Info

volume

50

issue

6