Film and surface stress during Al2O3 and AlF3 atomic layer deposition using in situ wafer curvature measurements
Journal Article
Overview
publication date
- December 1, 2025
Date in CU Experts
- December 24, 2025 10:30 AM
Full Author List
- Vanfleet RB; Sortino E; Cavanagh AS; Bright VM; George SM
author count
- 5
published in
- Applied Surface Science Journal
Other Profiles
International Standard Serial Number (ISSN)
- 0169-4332
Digital Object Identifier (DOI)
Additional Document Info
start page
- 165642
end page
- 165642
number
- 165642