publication venue for

• Thermal atomic layer etching of CoO using acetylacetone and ozone: Evidence for changes in oxidation state and crystal structure during sequential exposures 2023
• Effect of applied potential on metal surfaces: Surface energy, Wulff shape and charge distribution 2023
• Smoothing surface roughness using Al₂O₃ atomic layer deposition 2021
• Atomic layer deposited boron nitride nanoscale films act as high temperature hydrogen barriers 2021
• Atomic layer deposition of tungsten nitride films as protective barriers to hydrogen 2020
• Effect of time and deposition method on quality of phosphonic acid modifier self-assembled monolayers on indium zinc oxide 2016
• Optimizing amorphous indium zinc oxide film growth for low residual stress and high electrical conductivity 2013
• Wafer-scale fabrication of silicon nanowire arrays with controllable dimensions 2012
• TiO₂ atomic layer deposition on ZrO₂ particles using alternating exposures of TiCl₄ and H₂O 2004
• Self-assembled monolayers in the context of epitaxial film growth 2001
• H₂O and HCl adsorption on single crystal α-Al₂O₃(0001) at stratospheric temperatures 2001
• Atomic layer deposition of Al2O3 and SiO2 on BN particles using sequential surface reactions 2000
• Atomically controlled growth of tungsten and tungsten nitride using sequential surface reactions 2000
• Adsorption and desorption kinetics of tetrakis(dimethylamino)titanium and dimethylamine on TiN surfaces 1999
• Surface chemistry of In2O3 deposition using In(CH3)(3) and H2O in a binary reaction sequence 1997
• Atomic layer controlled deposition of Al2O3 films using binary reaction sequence chemistry 1996
• The GaAs/GaInP2 heterojunction for studying photoinduced charge transfer processes 1996
• Theory of silicon nanostructures 1996
• ATOMIC LAYER CONTROLLED DEPOSITION OF SIO2 AND AL2O3 USING ABAB - BINARY REACTION SEQUENCE CHEMISTRY 1994
• ISOTHERMAL H-2 DESORPTION-KINETICS FROM SI(100)2X1 - DEPENDENCE ON DISILANE AND ATOMIC-HYDROGEN PRECURSORS 1994