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- Atomic layer deposition of SiO2 and TiO2 in alumina tubular membranes:: Pore reduction and effect of surface species on gas transport
- Atomic layer deposition of SiO2 at room temperature using NH3-catalyzed sequential surface reactions
- Atomic layer deposition of SiO2 using catalyzed and uncatalyzed self-limiting surface reactions
- Atomic layer deposition of solid lubricating coatings on particles
- Atomic layer deposition of TiO2 films on particles in a fluidized bed reactor
- Atomic layer deposition of TiO2 for stabilization of Pt nanoparticle oxygen reduction reaction catalysts
- Atomic Layer Deposition of TiO2 on Graphene for Supercapacitors
- Atomic layer deposition of tungsten nitride films as protective barriers to hydrogen
- Atomic layer deposition of tungsten nitride films using sequential surface reactions
- Atomic layer deposition of tungsten using sequential surface chemistry with a sacrificial stripping reaction
- Atomic layer deposition of ultrathin and conformal Al2O3 films on BN particles
- Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
- Atomic layer deposition of UV-absorbing ZnO films on SiO2 and TiO2 nanoparticles using a fluidized bed reactor
- Atomic layer deposition of vanadium oxide to reduce parasitic absorption and improve stability in n-i-p perovskite solar cells for tandems
- Atomic Layer Deposition of Zn(O,S) Alloys Using Diethylzinc with H2O and H2S: Effect of Exchange Reactions
- Atomic layer deposition on bulk quantities of surfactant-modified single-walled carbon nanotubes
- Atomic layer deposition on gram quantities of multi-walled carbon nanotubes
- Atomic layer deposition on particles using a fluidized bed reactor with in situ mass spectrometry
- Atomic layer deposition ultrathin film origami using focused ion beams
- Atomic layer deposition-A novel method for the ultrathin coating of minitablets
- Atomic Layer Deposition: An Overview
- Atomic Layer Etching of Al2O3 Using Sequential, Self-Limiting Thermal Reactions with Sn(acac)2 and Hydrogen Fluoride
- Atomic Layer Etching of AlF3 Using Sequential, Self-Limiting Thermal Reactions with Sn(acac)2 and Hydrogen Fluoride
- Atomic layer etching of ferroelectric hafnium zirconium oxide thin films enables giant tunneling electroresistance
- Atomic Layer Etching of HfO2 Using Sequential, Self-Limiting Thermal Reactions with Sn(acac)2 and HF
- ATOMIC LAYER GROWTH OF SIO2 ON SI(100) USING SICL4 AND H2O IN A BINARY REACTION SEQUENCE
- Atomic layer growth using binary reaction sequence chemistry.
- Atomic level architecture of group I introns revealed
- Atomic Oxygen Effects on POSS Polyimides in Low Earth Orbit
- ATOMIC OXYGEN IN THE MARTIAN THERMOSPHERE