Journal Article RDF
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- Atomic layer controlled growth of Si3N4 films using sequential surface reactions
- Atomic layer controlled growth of SiO2 films using binary reaction sequence chemistry
- Atomic layer controlled growth of SiO2 films using self-limiting surface chemistry.
- Atomic layer deposited boron nitride nanoscale films act as high temperature hydrogen barriers
- Atomic Layer Deposited Coatings on Nanowires for High Temperature Water Corrosion Protection
- Atomic layer deposited protective coatings for micro-electromechanical systems
- Atomic layer deposited thin film metal oxides for fuel production in a solar cavity reactor
- Atomic Layer Deposited TiO2-IrOx Alloy as a Hole Transport Material for Perovskite Solar Cells
- Atomic layer deposition alpha-Al2O3 diffusion barriers to eliminate the memory effect in beta-gamma radioxenon detectors
- Atomic layer deposition enabled interconnect technology for vertical nanowire arrays
- Atomic layer deposition for high aspect ratio through silicon vias
- Atomic layer deposition in porous electrodes: A pore-scale modeling study
- Atomic layer deposition of Al2O3 and SiO2 on BN particles using sequential surface reactions
- Atomic layer deposition of Al2O3 films on polyethylene particles
- Atomic Layer Deposition of AlF3 Using Trimethylaluminum and Hydrogen Fluoride
- Atomic Layer Deposition of Aluminum Nitride and Oxynitride on Silicon Using Tris(dimethylamido)aluminum, Ammonia, and Water
- Atomic layer deposition of aluminum oxyfluoride thin films with tunable stoichiometry
- Atomic layer deposition of amorphous TiO2 on graphene as an anode for Li-ion batteries
- Atomic layer deposition of boron nitride using sequential exposures of BCl3 and NH3
- Atomic Layer Deposition of CdS Quantum Dots for Solid-State Quantum Dot Sensitized Solar Cells
- Atomic layer deposition of hafnium and zirconium oxyfluoride thin films
- Atomic layer deposition of hafnium nitrides using ammonia and alkylamide precursors
- Atomic layer deposition of hafnium oxide from hafnium chloride and water
- Atomic layer deposition of hafnium oxide: A detailed reaction mechanism from first principles
- Atomic layer deposition of HfO2 using alkoxides as precursors
- Atomic layer deposition of high-kappa dielectrics on nitrided silicon surfaces
- Atomic layer deposition of iron(III) oxide on zirconia nanoparticles in a fluidized bed reactor using ferrocene and oxygen
- Atomic Layer Deposition of Metal Fluorides Using HF-Pyridine as the Fluorine Precursor
- Atomic Layer Deposition of MgO Using Bis(ethylcyclopentadienyl)magnesium and H2O
- Atomic layer deposition of MnO using Bis(ethylcyclopentadienyl) manganese and H2O