Conference Proceeding RDF
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- Asymptotically reliable transport of multimedia/graphics over wireless channels
- Asymptotics beyond all orders
- Asynchronous and Distributed Tracking of Time-Varying Fixed Points
- Atmospheric and oceanic mesoscale flows in the Monterey Bay, California region
- Atmospheric boundary layer height measurements with wind profilers: Successes and cautions
- Atmospheric chemistry in the southeast U.S
- Atmospheric chemistry of peroxy nitric acid (PNA, HO2NO2
- Atmospheric components of the Arctic Ocean freshwater balance and their interannual variability
- Atmospheric components of the Arctic Ocean hydrologic budget assessed from rawinsonde data
- Atmospheric correction for two classes of hyperspectral imaging sensors
- Atmospheric Data System Sensor Placement Optimization for Mars Entry, Descent, and Landing
- Atmospheric ion-induced aerosol nucleation
- Atmospheric photochemistry of pyruvic acid and related oxoacids
- ATMOSPHERIC RADIOCARBON WORKSHOP REPORT
- Atmospheric Turbulence Measurements Using Small Unmanned Aircraft Systems
- Atom optics on a chip
- ATOM-OPTICAL ANALOGS OF ELECTRONIC COMPONENTS AND DEVICES
- Atomic clocks of the future: using the ultrafast and ultrastable
- Atomic force microscopic studies on the growth of self-assembled monolayers on SrTiO3-surfaces
- Atomic ion crystals in non-neutral plasmas
- Atomic Layer Deposited (ALD) coatings for future astronomical telescopes: recent developments
- ATOMIC LAYER DEPOSITED 1102 AS SACRIFICIAL LAYERS AND INTERNAL COATINGS FOR NANOSCALE GAPS
- Atomic layer deposited alumina for micromachined resonators
- Atomic layer deposition (ALD) technology for reliable RF MEMS
- ATOMIC LAYER DEPOSITION (ALD) TUNGSTEN NANOELECTROMECHANICAL TRANSISTORS
- ATOMIC LAYER DEPOSITION (ALD) TUNGSTEN NEMS DEVICES VIA A NOVEL TOP-DOWN APPROACH
- Atomic layer deposition for fabricating capacitive micromachined ultrasonic transducers: Initial characterization
- Atomic layer deposition of conformal dielectric and protective coatings for released micro-electromechanical devices
- Atomic Layer Deposition of Quantum Confined Nanostructures on Particles
- Atomic layer deposition of thin films using sequential surface reactions